Sensor and Device Cleanrooms

CRD – silicon detectors cleanroom

The silicon detectors cleanroom extends over 700 sqm, and is classified ISO 4-5. It is
equipped with a double-side mask aligner and a stepper granting a minimum line widht of 500 nm. It processes 150mm wafers and it is mainly dedicated to radiation sensors and integrated photonics. To maintain the yield and quality standards achieved it follows strict rules and requirements in terms of contamination (wafer exchange with other laboratories, materials and processes allowed).

The MEMS and NEMS cleanroom extends over 500 sqm, and is classified ISO 5-6 class. It is equipped with a single-side mask aligner with a minimum line width of 2.5 μm. It is a general purpose cleanroom facility with higher flexibility in terms of materials.

The packaging and integration cleanroom extends over 60 sqm, and is classified ISO 6 class. It is equipped with precision manual pick & place and bonder for prototype assembly.

The 3D integration cleanroom extends over 180 sqm, and is classified ISO 4/5 class. It is equipped with the complete line of systems which allow the processing of Back-side illuminated sensors and vertical integration, Wafer bonding (permanent metal, temporary) and debonding, TSV interconnections and Wafer grinding and polishing.

Sustainable Energies laboratories and testing facilities

Battery Laboratory

Laboratory for electro-chemical testing of new prototypes of next generation batteries.

Laboratory for electro-chemical and mechanical testing of new prototypes for hydrogen production

Laboratory for development of thin layers, nanostructured materials, novel energy conversion processes

Laboratory for characterization of physical and chemical properties on novel materials